GE9023 FUNDAMENTALS OF NANOSCIENCE Syllabus Regulation 2008 Anna University syllabus and question papers
ANNA UNIVERSITY :: CHENNAI 600 025
REGULATIONS 2008
CURRICULUM FOR B.E. COMPUTER SCIENCE AND ENGINEERING
Anna University Chennai B.E .Computer Science and Engineering Semester IV Regulations 2008 Syllabus
AIM:
To make the students understand the importance ,relevance and potentialities of this
emerging field of study.
OBJECTIVES:
Study the basic nano technology and nano science.
Understand interdisciplinary nature of this field.
Understand the important role of physics, chemistry ,biology.
Recognize that the rules of nano science are fundamentally different than those we experience.
Study the basic fabrication strategies of nano science.
UNIT I INTRODUCTION 10
Nanoscale Science and Technology- Implications for Physics, Chemistry, Biology and Engineering-Classifications of nanostructured materials- nano particles- quantum dots, nanowires-ultra-thinfilms-multilayered materials. Length Scales involved and effect on properties: Mechanical, Electronic, Optical, Magnetic and Thermal properties. Introduction to properties and motivation for study (qualitative only).
UNIT II PREPARATION METHODS 10
Bottom-up Synthesis-Top-down Approach: Precipitation, Mechanical Milling, Colloidal routes, Self-assembly, Vapour phase deposition, MOCVD, Sputtering, Evaporation, Molecular Beam Epitaxy, Atomic Layer Epitaxy, MOMBE.
UNIT III PATTERNING AND LITHOGRAPHY FOR NANOSCALE DEVICES 5
Introduction to optical/UV electron beam and X-ray Lithography systems and processes, Wet etching, dry (Plasma /reactive ion) etching, Etch resists-dip pen lithography
UNIT IV PREPARATION ENVIRONMENTS 10
Clean rooms: specifications and design, air and water purity, requirements for particular processes, Vibration free environments: Services and facilities required. Working Practices, Sample cleaning, Chemical Purification, Chemical and Biological contamination, Safety Issues, Flammable and Toxic Hazards, Biohazards.
UNIT V CHARECTERISATION TECHNIQUES 10
X-ray diffraction technique, Scanning Electron Microscopy - environmental techniques, Transmission Electron Microscopy including high-resolution imaging, Surface Analysis techniques- AFM, SPM, STM, SNOM, ESCA, SIMS-Nanoindentation
TOTAL: 45 PERIODS
TEXT BOOKS:
1. A.S. Edelstein and R.C. Cammearata, eds., “Nanomaterials: Synthesis, Properties and Applications”, Institute of Physics Publishing, Bristol and Philadelphia, 1996.
2. N John Dinardo, “Nanoscale charecterisation of surfaces & Interfaces”, 2nd Edition, Weinheim Cambridge, Wiley-VCH, 2000
REFERENCES:
1. G Timp (Editor), “Nanotechnology”, AIP press/Springer, 1999
2. Akhlesh Lakhtakia (Editor), “The Hand Book of Nano Technology,Nanometer Structure”, Theory, Modeling and Simulations, Prentice-Hall of India (P) Ltd, New Delhi, 2007.
ANNA UNIVERSITY :: CHENNAI 600 025
REGULATIONS 2008
CURRICULUM FOR B.E. COMPUTER SCIENCE AND ENGINEERING
Anna University Chennai B.E .Computer Science and Engineering Semester IV Regulations 2008 Syllabus
AIM:
To make the students understand the importance ,relevance and potentialities of this
emerging field of study.
OBJECTIVES:
Study the basic nano technology and nano science.
Understand interdisciplinary nature of this field.
Understand the important role of physics, chemistry ,biology.
Recognize that the rules of nano science are fundamentally different than those we experience.
Study the basic fabrication strategies of nano science.
UNIT I INTRODUCTION 10
Nanoscale Science and Technology- Implications for Physics, Chemistry, Biology and Engineering-Classifications of nanostructured materials- nano particles- quantum dots, nanowires-ultra-thinfilms-multilayered materials. Length Scales involved and effect on properties: Mechanical, Electronic, Optical, Magnetic and Thermal properties. Introduction to properties and motivation for study (qualitative only).
UNIT II PREPARATION METHODS 10
Bottom-up Synthesis-Top-down Approach: Precipitation, Mechanical Milling, Colloidal routes, Self-assembly, Vapour phase deposition, MOCVD, Sputtering, Evaporation, Molecular Beam Epitaxy, Atomic Layer Epitaxy, MOMBE.
UNIT III PATTERNING AND LITHOGRAPHY FOR NANOSCALE DEVICES 5
Introduction to optical/UV electron beam and X-ray Lithography systems and processes, Wet etching, dry (Plasma /reactive ion) etching, Etch resists-dip pen lithography
UNIT IV PREPARATION ENVIRONMENTS 10
Clean rooms: specifications and design, air and water purity, requirements for particular processes, Vibration free environments: Services and facilities required. Working Practices, Sample cleaning, Chemical Purification, Chemical and Biological contamination, Safety Issues, Flammable and Toxic Hazards, Biohazards.
UNIT V CHARECTERISATION TECHNIQUES 10
X-ray diffraction technique, Scanning Electron Microscopy - environmental techniques, Transmission Electron Microscopy including high-resolution imaging, Surface Analysis techniques- AFM, SPM, STM, SNOM, ESCA, SIMS-Nanoindentation
TOTAL: 45 PERIODS
TEXT BOOKS:
1. A.S. Edelstein and R.C. Cammearata, eds., “Nanomaterials: Synthesis, Properties and Applications”, Institute of Physics Publishing, Bristol and Philadelphia, 1996.
2. N John Dinardo, “Nanoscale charecterisation of surfaces & Interfaces”, 2nd Edition, Weinheim Cambridge, Wiley-VCH, 2000
REFERENCES:
1. G Timp (Editor), “Nanotechnology”, AIP press/Springer, 1999
2. Akhlesh Lakhtakia (Editor), “The Hand Book of Nano Technology,Nanometer Structure”, Theory, Modeling and Simulations, Prentice-Hall of India (P) Ltd, New Delhi, 2007.
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